In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 10^6 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.
Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications / Serra, E.; Bawaj, M.; Borrielli, A.; Di Giuseppe, G.; Forte, S.; Kralj, N.; Malossi, N.; Marconi, L.; Marin, F.; Marino, F.; Morana, B.; Natali, R.; Pandraud, G.; Pontin, A.; Prodi, G.A.; Rossi, M.; Sarro, P.M.; Vitali, D.; Bonaldi, M.. - In: AIP ADVANCES. - ISSN 2158-3226. - STAMPA. - 6:(2016), pp. 065004-065004. [10.1063/1.4953805]
Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications
MARCONI, LORENZO;MARIN, FRANCESCO;MARINO, FRANCESCO MARIO SIMONE;PONTIN, ANTONIO;
2016
Abstract
In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 10^6 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.
| File | Dimensione | Formato | |
|---|---|---|---|
|
2016_AIP.pdf
accesso aperto
Descrizione: Articolo principale
Tipologia:
Pdf editoriale (Version of record)
Licenza:
Creative commons
Dimensione
2.59 MB
Formato
Adobe PDF
|
2.59 MB | Adobe PDF |
I documenti in FLORE sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
