In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 10^6 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.

Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications / Serra, E.; Bawaj, M.; Borrielli, A.; Di Giuseppe, G.; Forte, S.; Kralj, N.; Malossi, N.; Marconi, L.; Marin, F.; Marino, F.; Morana, B.; Natali, R.; Pandraud, G.; Pontin, A.; Prodi, G.A.; Rossi, M.; Sarro, P.M.; Vitali, D.; Bonaldi, M.. - In: AIP ADVANCES. - ISSN 2158-3226. - STAMPA. - 6:(2016), pp. 065004-065004. [10.1063/1.4953805]

Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications

MARCONI, LORENZO;MARIN, FRANCESCO;MARINO, FRANCESCO MARIO SIMONE;PONTIN, ANTONIO;
2016

Abstract

In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 10^6 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.
2016
6
065004
065004
Serra, E.; Bawaj, M.; Borrielli, A.; Di Giuseppe, G.; Forte, S.; Kralj, N.; Malossi, N.; Marconi, L.; Marin, F.; Marino, F.; Morana, B.; Natali, R.; Pandraud, G.; Pontin, A.; Prodi, G.A.; Rossi, M.; Sarro, P.M.; Vitali, D.; Bonaldi, M.
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Utilizza questo identificatore per citare o creare un link a questa risorsa: https://hdl.handle.net/2158/1066431
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