CdSe electrodeposition on n-Si (100) substrate was investigated in sulfuric acid solution. The behaviour and the deposition of the precursors (Cd and Se) were studied separately at first. Then, we explored both the alternated deposition, one layer by one, as well as the simultaneous co-deposition of the two elements to form the CdSe semiconductor. Varying the deposition conditions, we were able to obtain nanoparticles, or a thin film, on the surface of the electrode. The samples were then characterised microscopically and spectroscopically with SEM, XRD and XPS. Finally, we evaluated the induced photoemission of the deposit for the application in optoelectronics.
Electrodeposition of nanoparticles and continuous film of CdSe on n-Si (100) / Giurlani Walter; Dell'Aquila Vincenzo; Vizza Martina; Calisi Nicola; Lavacchi Alessandro; Irrera Aalessia; Lo Faro Maria Josè; Leonardi Antonio Alessio; Morganti Dario; Innocenti Massimo. - In: NANOMATERIALS. - ISSN 2079-4991. - ELETTRONICO. - 9:(2019), pp. 1504-1504. [10.3390/nano9101504]
Electrodeposition of nanoparticles and continuous film of CdSe on n-Si (100)
Giurlani Walter;Dell'Aquila Vincenzo;Vizza Martina;Calisi Nicola;Lavacchi Alessandro;Innocenti Massimo
2019
Abstract
CdSe electrodeposition on n-Si (100) substrate was investigated in sulfuric acid solution. The behaviour and the deposition of the precursors (Cd and Se) were studied separately at first. Then, we explored both the alternated deposition, one layer by one, as well as the simultaneous co-deposition of the two elements to form the CdSe semiconductor. Varying the deposition conditions, we were able to obtain nanoparticles, or a thin film, on the surface of the electrode. The samples were then characterised microscopically and spectroscopically with SEM, XRD and XPS. Finally, we evaluated the induced photoemission of the deposit for the application in optoelectronics.
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