Electrodeposition of metals on silicon for enhanced silicon nanowires (NWs) Fabrication via metal assisted chemical etching (MACE)

In this study, gold nanoparticles were electrodeposited onto a silicon substrate and evaluated for their potential use in metal-assisted chemical etching (MACE). Electrodeposition offers high scalability while reducing material waste compared to vapor-phase deposition techniques, and provides greater control than wet electroless deposition. Various deposition conditions including the oxidation state of the gold salt, pH, reduction potential, and deposition time were tested to determine the optimal combination for producing thin, homogeneous silicon nanowires (NWs) via MACE. The resulting deposits and NWs were thoroughly characterized using a scanning electron microscope (SEM). This approach could open new possibilities for developing smaller, higher-performance sensors and high-surface-area electrodes, particularly when Si NWs are decorated with metals or other chemical species.