Within the framework of the INFN-CSN5 PROVIDE experiment, we fabricated planar detectors by depositing 1-μm-thick films using radio-frequency magnetron sputtering (RF-MS). These films were grown on both commercial and in-house substrates featuring various interdigitated electrode (IDE) geometries on both rigid and flexible platforms. Our characterization revealed that key detector parameters — including an effective room-temperature resitivity ρ ≈ 107Ω cm and a mobility-lifetime product μτ ≈ 2 × 10-7cm2/V, derived from a Hecht-expression best-fit under 450 nm UV LED irradiation, remained consistent regardless of the substrate type or electrode configuration. Furthermore, we measured a responsivity of approximately 0.2 A/W for optical powers up to at 450 nm. We also prototyped optimized, fully in-house detectors consisting of thin films grown by the Firenze Unit on flexible Kapton substrates, which were equipped with Cr/Au IDEs produced via lithography and thermal evaporation by the Bologna Unit. When exposed to a 300 ps UV (355 nm) laser pulse, these devices demonstrated a fast response with a 1 ns rise time and slew rates of up to 0.14 V/ns, depending on the applied bias. These performances, comparable to reference silicon photodiodes, will possibly open the way to a new class of high-speed thin-film radiation detectors. The results will be further exploited in the near future for advanced high-energy photon and particle detection.

Development of thin-film inorganic perovskite UV photodetectors / Bruzzi, M., Forcieri, L., Civinini, C., Vinattieri, A., Basiricò, L., Fraboni, B.. - In: JOURNAL OF INSTRUMENTATION. - ISSN 1748-0221. - ELETTRONICO. - 21:(2026), pp. C05022.1-C05022.11. [10.1088/1748-0221/21/05/c05022]

Development of thin-film inorganic perovskite UV photodetectors

Bruzzi, Mara;Forcieri, Leonardo;Vinattieri, Anna;
2026

Abstract

Within the framework of the INFN-CSN5 PROVIDE experiment, we fabricated planar detectors by depositing 1-μm-thick films using radio-frequency magnetron sputtering (RF-MS). These films were grown on both commercial and in-house substrates featuring various interdigitated electrode (IDE) geometries on both rigid and flexible platforms. Our characterization revealed that key detector parameters — including an effective room-temperature resitivity ρ ≈ 107Ω cm and a mobility-lifetime product μτ ≈ 2 × 10-7cm2/V, derived from a Hecht-expression best-fit under 450 nm UV LED irradiation, remained consistent regardless of the substrate type or electrode configuration. Furthermore, we measured a responsivity of approximately 0.2 A/W for optical powers up to at 450 nm. We also prototyped optimized, fully in-house detectors consisting of thin films grown by the Firenze Unit on flexible Kapton substrates, which were equipped with Cr/Au IDEs produced via lithography and thermal evaporation by the Bologna Unit. When exposed to a 300 ps UV (355 nm) laser pulse, these devices demonstrated a fast response with a 1 ns rise time and slew rates of up to 0.14 V/ns, depending on the applied bias. These performances, comparable to reference silicon photodiodes, will possibly open the way to a new class of high-speed thin-film radiation detectors. The results will be further exploited in the near future for advanced high-energy photon and particle detection.
2026
21
1
11
Goal 7: Affordable and clean energy
Bruzzi, Mara; Forcieri, Leonardo; Civinini, Carlo; Vinattieri, Anna; Basiricò, Laura; Fraboni, Beatrice
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Utilizza questo identificatore per citare o creare un link a questa risorsa: https://hdl.handle.net/2158/1499076
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