Molybdenum disulfide (MoS2) has attracted great attention for its unique chemical and physical properties. The applications of this transition metal dichalcogenide (TMDC) range from supercapacitors to dye-sensitized solar cells, Li-ion batteries and catalysis. This work opens new routes toward the use of electrodeposition as an easy, scalable and cost-effective technique to perform the coupling of Si with molybdenum disulfide. MoS2 deposits were obtained on n-Si (100) electrodes by electrochemical deposition protocols working at room temperature and pressure, as opposed to the traditional vacuum-based techniques. The samples were characterized by X-ray Photoelectron Spectroscopy (XPS), Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM) and Rutherford Back Scattering (RBS).

Electrodeposition of Molybdenum Disulfide (MoS2) Nanoparticles on Monocrystalline Silicon / Martina Vizza; Walter Giurlani; Lorenzo Cerri; Nicola Calisi; Antonio Alessio Leonardi; Maria Josè Lo Faro; Alessia Irrera; Enrico Berretti; Juan Víctor Perales-Rondón; Alvaro Colina; Elena Bujedo Saiz; Massimo Innocenti. - In: MOLECULES. - ISSN 1420-3049. - ELETTRONICO. - 27:(2022), pp. 0-0. [10.3390/molecules27175416]

Electrodeposition of Molybdenum Disulfide (MoS2) Nanoparticles on Monocrystalline Silicon

Martina Vizza
;
Walter Giurlani;Nicola Calisi;Massimo Innocenti
2022

Abstract

Molybdenum disulfide (MoS2) has attracted great attention for its unique chemical and physical properties. The applications of this transition metal dichalcogenide (TMDC) range from supercapacitors to dye-sensitized solar cells, Li-ion batteries and catalysis. This work opens new routes toward the use of electrodeposition as an easy, scalable and cost-effective technique to perform the coupling of Si with molybdenum disulfide. MoS2 deposits were obtained on n-Si (100) electrodes by electrochemical deposition protocols working at room temperature and pressure, as opposed to the traditional vacuum-based techniques. The samples were characterized by X-ray Photoelectron Spectroscopy (XPS), Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM) and Rutherford Back Scattering (RBS).
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Martina Vizza; Walter Giurlani; Lorenzo Cerri; Nicola Calisi; Antonio Alessio Leonardi; Maria Josè Lo Faro; Alessia Irrera; Enrico Berretti; Juan Víctor Perales-Rondón; Alvaro Colina; Elena Bujedo Saiz; Massimo Innocenti
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/2158/1279927
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