Selective Electrodesorption Based Atomic Layer Deposition (SEBALD) was used to prepare new bimetallic electrodes for fuel cells. This new method of Electrodeposition, recently pointed out in Florence on the base of ECALE method, allows to deposit under morphological and compositional control those metals that cannot be deposited at underpotential.
New technologic Substrates by Electrodeposition for Energy devices / Massimo Innocenti; Lucia Becucci; Silvano Bellandi; Ilaria Bencistà; Francesco Di Benedetto; Francesca Loglio; Maurizio Muniz-Miranda; Maurizio Romanelli; Maria Luisa Foresti. - ELETTRONICO. - (2011), pp. 2266-2266. (Intervento presentato al convegno 220th ECS Meeting tenutosi a Boston nel October 9-14, 2011).
New technologic Substrates by Electrodeposition for Energy devices
INNOCENTI, MASSIMO;BECUCCI, LUCIA;BELLANDI, SILVANO;BENCISTA', ILARIA;DI BENEDETTO, FRANCESCO;LOGLIO, FRANCESCA;MUNIZ-MIRANDA, MAURIZIO;ROMANELLI, MAURIZIO;FORESTI, MARIA LUISA
2011
Abstract
Selective Electrodesorption Based Atomic Layer Deposition (SEBALD) was used to prepare new bimetallic electrodes for fuel cells. This new method of Electrodeposition, recently pointed out in Florence on the base of ECALE method, allows to deposit under morphological and compositional control those metals that cannot be deposited at underpotential.
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